Photosensitization of optical fiber and silica-on-silicon/silica waveguides

Creator: 

  • Bilodeau, F.
  • Malo, B.
  • Albert, Jacques
  • Johnson, D.C.
  • Hill, K.O.
  • Hibino, Y.
  • Abe, M.
  • Kawachi, M.

Date: 

1993-06-15

Abstract: 

Localized heating with a flame is shown to be a simple and effective method for substantially augmenting the photosensitivity of high-silica optical waveguides to (UV) light. The method increases the photosensitivity of standard (Ge-doped core) telecommunications fiber by a factor greater than 10 (photoinduced ΔnUV > 10−3) and renders strongly photosensitive the cores of high-quality Ge:SiO2-on-Si and Ge:SiO2-on-SiO2 planar waveguides that were negligibly photosensitive before treatment. We have written large-modulation-depth Bragg gratings, in both fiber and planar optical waveguides photosensitized by our method, using KrF (249-nm) radiation incident upon the waveguides through a zero-order-nulled phase mask. It is noteworthy that photosensitization by our method is achieved with a negligible increase in loss at the three principal optical communication windows.

Publisher: 

OSA Publishing

Peer Review: 

Published in Peer Reviewed Journal

Faculty Name: 

Faculty of Engineering and Design

Department Name: 

Department of Electronics

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