Photosensitivity in Ge-doped silica optical waveguides and fibers with 193-nm light from an ArF excimer laser


  • Albert, Jacques
  • Malo, B.
  • Bilodeau, Francois
  • Johnson, D.C.
  • Hill, K.O.
  • Hibino, Y.
  • Kawachi, M.




Photosensitivity in optical fibers and waveguides has been associated with the bleaching of an absorption band located near 5.0 eV (or 242 nm). We present new results for Bragg grating formation and UV bleaching experiments carried out using 193-nm light from an ArF excimer laser instead of the usual laser sources operating near 242 or 248 nm.


OSA Publishing

Peer Review: 

Published in Peer Reviewed Journal

Faculty Name: 

Faculty of Engineering and Design

Department Name: 

Department of Electronics

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