Creator:
- Albert, Jacques
- Hill, K.O.
- Johnson, D.C.
- Bilodeau, F.O.
- Rooks, M.J.
Date:
1996-11-21
Abstract:
A Moire technique is used in the fabrication of a diffractive phase mask by electron beam lithography. The phase mask has a varying diffraction efficiency designed to produce apodised fibre Bragg gratingswith a uniform ultraviolet beam exposure. Since the illumination is uniform, the average induced refractive index is constant along the grating and pure apodisation results
Publisher:
IET
Identifier:
Peer Review:
Published in Peer Reviewed Journal
Faculty Name:
Faculty of Engineering and Design
Department Name:
Department of Electronics