Creator:
- Albert, Jacques
- Malo, B.
- Hill, K.O.
- Johnson, D.C.
Date:
1992-12-01
Abstract:
The changes in refractive index, optical absorption, and volume of synthetic fused silica resulting from the implantation of germanium and silicon ions at energies of 3 and 5 MeV are reported. Implantation changes the density and generates ultraviolet color centers in the silica, which increases the refractive index at visible wavelengths by ∼1%. Irradiation of the implanted samples with 249-nm light from a KrF excimer laser photobleaches the color centers and reduces the index by more than 0.1%. Photobleaching is used to write a 4.3-μm pitch diffraction grating in the implanted silica.
Publisher:
OSA Publishing
Identifier:
Peer Review:
Published in Peer Reviewed Journal
Faculty Name:
Faculty of Engineering and Design
Department Name:
Department of Electronics