Surfactant-Assisted Chemical Vapour Deposition of Gold Nanoplates with Highly Smooth Surface
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Tetrahydrothiophene (THT), as a surfactant, was studied for the shape control of gold nanoplates via chemical vapour deposition (CVD). Dense gold nanoplates (6 μm) with a highly smooth surface were deposited by using 1,3-diisopropyl-imidazol-2-ylidene gold (I) hexamethyldisilazide at 370˚C, with 45 mtorr of THT. Similar but isolated nanoplates were attained with 15-35 mtorr of THT at 430˚C. Along with single-crystalline structure, a {111} plane of the nanoplates was confirmed by determining the gold stack¬ing fault, 1/3{422} diffractions in selected area electron diffraction (SAED) patterns. Purity of the nanoplates was shown by energy dispersive X-ray spectroscopy (EDS) and X-ray photoelectron spectroscopy (XPS) analysis, both showing gold metal without significant sulfur impurities. THT preferably capped the gold {111} plane which lowered the surface energy, leading to a smooth surface and large size. Gold precursor supply influenced the particle size and mechan¬ism of the crystal growth, as well as the particle density.
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Copyright © 2016 the author(s). Theses may be used for non-commercial research, educational, or related academic purposes only. Such uses include personal study, research, scholarship, and teaching. Theses may only be shared by linking to Carleton University Institutional Repository and no part may be used without proper attribution to the author. No part may be used for commercial purposes directly or indirectly via a for-profit platform; no adaptation or derivative works are permitted without consent from the copyright owner.
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