Surfactant-Assisted Chemical Vapour Deposition of Gold Nanoplates with Highly Smooth Surface

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Zhang, Weipeng




Tetrahydrothiophene (THT), as a surfactant, was studied for the shape control of gold nanoplates via chemical vapour deposition (CVD). Dense gold nanoplates (6 μm) with a highly smooth surface were deposited by using 1,3-diisopropyl-imidazol-2-ylidene gold (I) hexamethyldisilazide at 370˚C, with 45 mtorr of THT. Similar but isolated nanoplates were attained with 15-35 mtorr of THT at 430˚C. Along with single-crystalline structure, a {111} plane of the nanoplates was confirmed by determining the gold stack¬ing fault, 1/3{422} diffractions in selected area electron diffraction (SAED) patterns. Purity of the nanoplates was shown by energy dispersive X-ray spectroscopy (EDS) and X-ray photoelectron spectroscopy (XPS) analysis, both showing gold metal without significant sulfur impurities. THT preferably capped the gold {111} plane which lowered the surface energy, leading to a smooth surface and large size. Gold precursor supply influenced the particle size and mechan¬ism of the crystal growth, as well as the particle density.


Inorganic Chemistry




Carleton University

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